carbon optic technologies
The main goal of this research work is the creation of the scientific and technological basis to make novel diffractive approaches for a highly flexible fabrication of micro- and nanostructures for optical applications available. The knowledge gained will be used for the consistent development of innovative technological methods for the precise realization of very small optical structures on application-relevant areas. Furthermore, those techniques can be transferred with reasonable investments onto the existing infrastructure of the optical industry.
An essential part of research activities is focused on the implementation of a new kind of photolithography based on optical diffraction principles as advancement of the innovative approach of the diffractive Talbot-lithography. In addition to the resolution increase the method also offers a huge flexiblility to generate continuous surface profiles which are necessary in optical applications for the dedicated control of the element function. Another important aspect of the project represents the nano-structuring of high-refractive index materials which offers an outstanding potential for the realization of new customized optical functionalities. In this context the typical layer materials such as Ta2O5, TiO2 or HfO2, but also diamond are of interest. Based on the work for the development of the new structuring technologies promising example applications are addressed and investigated in the frame of a third work package. This includes e.g. the use of diffraction lithography for the realization of photonic crystal structures to improve the light extraction from LEDs as well as the development of high efficient diamond gratings for the wavelength coupling of high-power lasers.
CONTACT
Dr. habil. Uwe Detlef ZeitnerInstitute of Applied Physics
Max-Wien-Platz 1
07743 Jena
Germany
Uwe.Zeitner@iof.fraunhofer.de
+49 (0) 3641 947 988
+49 (0) 3641 947 802 (fax)
1.
© ultra optics | IMPRINT


